Wednesday, July 8. 9 a.m.-5 p.m., SEEC S228 

Interested in building nano-scale devices for cutting-edge scientific and technological applications? Join the Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) for a one-day, immersive workshop exploring electron beam lithography (EBL).
This introductory, hands-on experience is designed for prospective users interested in applying EBL to research, proof-of-concept development and prototyping. Participants will gain foundational knowledge of EBL and observe a live fabrication demonstration using COSINC’s state-of-the-art 100kV Raith EBPG 5150+ system.

Applications span a wide range of fields, including quantum systems, integrated photonics, biomedical engineering, MEMS/NEMS, nanoscience and semiconductor technologies. No prior experience is required.

Attendance is limited to 10 participants.

Workshop Agenda

9 a.m.–12 p.m. | Morning Session: EBL Fundamentals & Applications

• Overview of COSINC and National Quantum Nanofab (NQN) updates
• Fundamentals of electron beam lithography
• Introduction to the Raith EBPG 5150+ system
• EBL capabilities at COSINC
• Application examples in quantum devices, photonics, MEMS and microelectronics, biomedical technologies, and semiconductor systems

12–1 p.m. | Lunch & Networking
Pizza lunch provided; connect with researchers and COSINC staff.

1–5 p.m. | Live Fabrication Demonstration
Observe a real-time EBL process and gain insight into nanoscale fabrication workflows.